Homoepitaxial growth of Si-doped β-Ga₂O₃ films on semi-insulating (100) β-Ga₂O₃ substrates by metalorganic chemical vapor deposition (MOCVD) is studied in this work. By appropriately optimizing the growth conditions, an increasing diffusion length of Ga adatoms is realized, suppressing 3D island growth patterns prevalent in (100) β-Ga₂O₃ films and optimizing the surface morphology with [010] oriented stripe features. The slightly Si-doped β-Ga₂O₃ film shows smooth and flat surface morphology with a root-mean-square roughness of 1.3 nm. Rocking curves of the (400) diffraction peak also demonstrate the high crystal quality of the Si-doped films. According to the capacitance–voltage characteristics, the effective net doping concentrations of the films are 5.41 × 10¹⁵ – 1.74 × 10²⁰ cm⁻³. Hall measurements demonstrate a high electron mobility value of 51 cm²/(V·s), corresponding to a carrier concentration of 7.19 × 10¹⁸ cm⁻³ and a high activation efficiency of up to 61.5%. Transmission line model (TLM) measurement shows excellent Ohmic contacts and a low specific contact resistance of 1.29 × 10^-4 Ω·cm² for the Si-doped film, which is comparable to the Si-implanted film with a concentration of 5.0 × 10¹⁹ cm⁻³, confirming the effective Si doing in the MOCVD epitaxy.

Sb-doped β-Ga2O3 crystals were grown using the optical floating zone (OFZ) method. X-ray diffraction data and X-ray rocking curves were obtained, and the results revealed that the Sb-doped single crystals were of high quality. Raman spectra revealed that Sb substituted Ga mainly in the octahedral lattice. The carrier concentration of the Sb-doped single crystals increased from 9.55×1016 to 8.10×1018cm-3, the electronic mobility depicted a decreasing trend from 153.1 to 108.7cm2·V-1·s-1, and the electrical resistivity varied from 0.603 to 0.017 Ω·cm with the increasing Sb doping concentration. The un-doped and Sb-doped β-Ga2O3 crystals exhibited good light transmittance in the visible region; however, the evident decrease in the infrared region was caused by increase in the carrier concentration. The Sb-doped β-Ga2O3 single crystals had high transmittance in the UV region as well, and the cutoff edge appeared at 258 nm.

Four single crystals (Yb_0.15Lu_0.85xY_0.85-0.85x)₃Al₅O₁₂ (x = 0, 0.25, 0.5, 1) were grown by the Czochralski method. The correlation of the host atom Lu:Y ratios with the density and the luminescence properties were revealed. The density increases linearly with increasing of Lu3+ content, which will improve the gamma ray cut-off ability. The integrated intensity of the X-ray excited luminescence spectrum increases exponentially with the increasing Y:Lu ratio, while the decay time becomes even shorter with the increasing Lu3+ content. These results will provide a basis to balance the comprehensive properties to match different application requirements.

To reduce the seed length while maintaining the advantages of the cuboid KDP-type crystal, a long-seed KDP crystal with size $471~\text{mm}\times 480~\text{mm}\times 400~\text{mm}$ is rapidly grown. With almost the same high cutting efficiency to obtain third harmonic generation oriented samples, this long-seed KDP-type crystal can be grown with a shorter seed than that of the cuboid KDP-type crystal. The full width at half maximum of the high-resolution X-ray diffraction of the (200) crystalline face is 28.8 arc seconds, indicating that the long-seed KDP crystal has good crystalline quality. In the wavelength range of 377–1022 nm, the transmittance of the long-seed KDP crystal is higher than 90%. The fluence for the 50% probability of laser-induced damage (LID) is $18.5~\text{J}/\text{cm}^{2}$ (3 ns, 355 nm). Several test points survive when the laser fluence exceeds $30~\text{J}/\text{cm}^{2}$ (3 ns, 355 nm), indicating the good LID performance of the long-seed KDP crystal. At present, the growth of a long-seed DKDP crystal is under way.

The rapid development of bulk β-Ga₂O₃ crystals has attracted much attention to their use as ultra-wide bandgap materials for next-generation power devices owing to its large bandgap (~ 4.9 eV) and large breakdown electric field of about 8 MV/cm. Low cost and high quality of large β-Ga₂O₃ single-crystal substrates can be attained by melting growth techniques widely used in the industry. In this paper, we first present an overview of the properties of β-Ga₂O₃ crystals in bulk form. We then describe the various methods for producing bulk β-Ga₂O₃ crystals and their applications. Finally, we will present a future perspective of the research in the area in the area of single crystal growth.